Process for investigating particles situated in a

专利名称：Process for investigating particles situated in

a gas

发明人：Heinz K. Burtscher,Daniel A. Matter,Ulrich

Kogelschatz

申请号：US08/202136申请日：19940225公开号：US05431714A公开日：19950711

摘要：In the process for investigating particles situated in a gas, a gas stream is guidedpast a miniaturized UV excimer radiator. In this case, the particles are ionized andsubsequently filtered out, and the resultant photoelectrically induced current ismeasured. Since particles from different sources (petrol engine, diesel engine, cigarettesmoke) exhibit a wavelength dependence which is characteristic of the source, bymeasurements at at least two wavelengths, which is readily possible when using UVexcimer radiators with different gas fillings, pollutants can be detected according to thesource.

申请人：ABB RESEARCH LTD.

代理机构：Oblon, Spivak, McClelland, Maier & Neustadt

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