Apparatus and method for the thermal treatment of

专利名称：Apparatus and method for the thermal

treatment of substrates

发明人：Oliver Pursche,Peter Volk申请号：US13988825申请日：20111216公开号：US09214367B2公开日：20151215

专利附图：

摘要：The application describes an apparatus and a method for the thermal

treatment of substrates, in particular thin film substrates for photovoltaic applications.The apparatus comprises at least one substrate carrier for supporting a substrate, a

heating unit having at least one heating element for heating a substrate located on thesubstrate carrier and at least one heating element carrier for supporting the at least oneheating element. The heating element carrier is designed to allow a local change indistance between the substrate carrier and the heating element, so as to be able toprovide locally different heating intensities. In the method such a change in distance iscarried out during the thermal treatment.

申请人：Oliver Pursche,Peter Volk

地址：Ulm DE,Griesingen DE

国籍：DE,DE

代理机构：Tarolli, Sundheim, Covell & Tummino LLP

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